forked from Emi/ELOS-License-Builder
601 B
601 B
Licensing
This project is dual licensed under the CNPL-NA v7+ and the FAFOL v0.2 at your leisure.
Additionally, this project's source code is distributed along with the font
Résistance
and Lack
, both produced by Velvetyne Type Foundry and
made available under the SIL Open Font License v1.1