Fabrication technology for silicon and gallium arsenide integrated circuits with emphasis on sub-micron structures. Topics include epitaxy, diffusion, binary and ternary phase diagrams, grown and deposited oxides and nitrides, polysilicon and silicide technology, single-and multi-metal systems, plasma and chemical etching, ion milling photo, e-beam and X-ray lithography.
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| 2017 |
Vlsi Fabrication Tech (3c)
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| 2015 |
Vlsi Fabrication Tech (3c)
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| 2012 |
Vlsi Fabrication Tech (3c)
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| 2010 |
Vlsi Fabrication Tech (3c)
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| 2008 |
Vlsi Fabrication Tech (3c)
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