Theory and practice of IC fabrication in a research laboratory environment. Test chips are fabricated and the resulting devices and circuits evaluated. Processes and fabrication equipment studied and used include oxidation/diffusion, CVD reactors, photolithography, plasma etching, vacuum evaporator, ion implantation, etc. Instruments used in process monitoring and final testing include thin film profilometer, ellipsometer, resistivity probe, scanning electron microscope, capacitance-voltage system, etc. The fundamentals of hazardous material handling and clean room procedures are studied.
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2023 |
Ic Fabrication Lab (3c)
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2022 |
Ic Fabrication Lab (3c)
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2021 |
Ic Fabrication Lab (3c)
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2020 |
Ic Fabrication Lab (3c)
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2019 |
Ic Fabrication Lab (3c)
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2018 |
Ic Fabrication Lab (3c)
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2017 |
Ic Fabrication Lab (3c)
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2016 |
Ic Fabrication Lab (3c)
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2015 |
Ic Fabrication Lab (3c)
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2014 |
Ic Fabrication Lab (3c)
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2013 |
Ic Fabrication Lab (3c)
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2012 |
Ic Fabrication Lab (3c)
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2011 |
Ic Fabrication Lab (3c)
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2010 |
Ic Fabrication Lab (3c)
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2009 |
Ic Fabrication Lab (3c)
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2008 |
Ic Fabrication Lab (3c)
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2007 |
Ic Fabrication Lab (3c)
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2006 |
Ic Fabrication Lab (3c)
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2005 |
Ic Fabrication Lab (3c)
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2004 |
Ic Fabrication Lab (3c)
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2003 |
Ic Fabrication Lab (3c)
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2002 |
Ic Fabrication Lab (3c)
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2001 | ||||
2000 | ||||
1999 |
Ic Fabrication Lab (3c)
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1998 |