Emi/ELOS-License-Builder
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ELOS-License-Builder/LICENSE.md

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Licensing

This project is dual licensed under the CNPL-NA v7+ and the FAFOL v0.2 at your leisure.

Additionally, this project's source code is distributed along with the font Résistance and Lack, both produced by Velvetyne Type Foundry and made available under the SIL Open Font License v1.1